Please enable JavaScript.

Coggle requires JavaScript to display documents.

Semiconductor Domain : - Coggle Diagram

- - - - Gallium Arsenide (GaAs)
      - Gallium Nitride (GaN)
      - Indium Phosphide (InP)
      - Indium Arsenide (InAs)
      - Aluminum Gallium Arsenide (AlGaAs)
      - Aluminum Nitride (AlN)
      - Indium Gallium Arsenide (InGaAs)
      - Gallium Phosphide (GaP)
      - Indium Antimonide (InSb)
      - Aluminum Indium Arsenide (AlInAs)
      - Indium Gallium Nitride (InGaN)
    - - Cadmium Telluride (CdTe)
      - Zinc Sulfide (ZnS)
      - Zinc Selenide (ZnSe)
      - Cadmium Sulfide (CdS)
      - Mercury Cadmium Telluride (HgCdTe)
      - Zinc Telluride (ZnTe)
      - Cadmium Selenide (CdSe)
      - Mercury Telluride (HgTe)
    - - Silicon Carbide (SiC)
      - Germanium Carbide (GeC)
      - Silicon Germanium (SiGe)
- - - - Front-End Design Tools
        
        HDL Editors & Entry Tools
        
        Vivado
        
        Synopsys VCS
        
        Cadence Xcelium
        
        Simulation Tools
        
        ModelSim
        
        Cadence Xcelium
        
        Synopsys VCS
        
        Synthesis Tools
        
        Cadence Genus
        
        Synopsys Design Compiler
        
        Formal Verification Tools
        
        Synopsys Formality
        
        JasperGold (Cadence)
    - - Process Simulation Tools
      - Device Simulation Tools
      - Reliability & Stress Simulation
      - Lithography Simulation
- - - - Inner diameter (ID) slicing
      - Diamond wire sawing
    - - Edge grinding
      - Lapping
      - CMP (planarization)
    - - MBE (Molecular Beam Epitaxy)
      - MOCVD (Metal-Organic CVD)
      - Epitaxial silicon growth
    - - Float Zone (FZ)
      - Bridgman-Stockbarger
      - Czochralski (CZ)
  - - - Extreme UV (EUV: 13.5 nm)
      - Deep UV (DUV: 193 nm)
  - - - Reactive Ion Etching (RIE)
      - Plasma Etching
      - Ion Beam Etching
      - Deep Reactive Ion Etching (DRIE)
    - - Isotropic Wet Etching
      - Anisotropic Wet Etching
      - Selective Wet Etching
      - Non-selective Wet Etching
  - - - Sputtering
      - Evaporation
    - - Low-pressure CVD (LPCVD)
      - Plasma-enhanced CVD (PECVD)