Please enable JavaScript.
Coggle requires JavaScript to display documents.
Wafering Process - Coggle Diagram
Wafering Process
Inspections
Wafers flatness and surface cleanliness (particle-free) are key factors as a substrate for recent leading-edge ULSI devices. Individual wafer flatness and surface particles are measured using specially designed inspection tools to assure wafer quality.
-
-
-
Hall Effect Measurement
determine the material type, carrier concentration and carrier mobility
When current flow (from left to right), electrons flow in the opposite direction (from right to left) and the magnetic field, B is normally tangential to the current flow. When the electron moves across, they will not be evenly distributed due to the magnetic field. As a result, top and bottom will have a different potential which can be measured.
-
-
Packaging
Wafers are packaged in a clean shipping case, and sealed in a special moisture-proof bag.
-